We operate a custom-built high-resolution ARPES system
- MBS A-1 analyzer with scanning lens
- LEOS Solutions 6 eV cw-laser
- Lumeras 11 eV laser (50 MHz)
- MBS L-1 He-lamp with SPECS TMM 304 monochromator
- Geneva / Diamond 6 axes sample goniometer
- Omicron 3-grid LEED
- Sputter / anneal station, ports for effusion cells
- Combined energy resolution of 0.8 meV
- Base temperature 2.6 K
- Spatial resolution 1.8 mm
Off-axis RF sputter deposition system with 2 sources and resistive sample heater. Fully UHV compatible construction with in-situ sample transfer to laser-ARPES system.
Glove box with fully motorized van der Waals transfer stage for the preparation of air-sensitive heterostructures (collaboration with Morpurgo group).