Facilities

High-resolution ARPES

We operate a custom-built high-resolution ARPES system

• MBS A-1 analyzer with scanning lens
• LEOS Solutions 6 eV cw-laser
• Lumeras 11 eV laser (50 MHz)
• MBS L-1 He-lamp with SPECS TMM 304 monochromator
• Geneva / Diamond 6 axes sample goniometer
• Omicron 3-grid LEED
• Sputter / anneal station, ports for effusion cells

Performance:

• Combined energy resolution of 0.8 meV
• Base temperature 2.6 K
• Spatial resolution 1.8 mm

Off-axis RF sputter deposition system with 2 sources and resistive sample heater. Fully UHV compatible construction with in-situ sample transfer to laser-ARPES system.

Glove box with fully motorized van der Waals transfer stage for the preparation of air-sensitive heterostructures (collaboration with Morpurgo group).